发明名称 |
SILICON CARBIDE SUBSTRATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SILICON CARBIDE SUBSTRATE AND SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a silicon carbide substrate manufacturing method, a semiconductor device manufacturing method, a silicon carbide substrate and a semiconductor device which together make it possible to reduce the manufacturing cost of a semiconductor device using a silicon carbide substrate. <P>SOLUTION: The silicon carbide substrate manufacturing method comprises: a step of preparing a base substrate 10 and a SiC substrate 20; a step of producing a multilayer substrate by stacking the base substrate 10 and the SiC substrate 20 one on top of the other; a step of producing a joined substrate 3 by heating the multilayer substrate; a step of heating the joined substrate 3 so that the temperature of the base substrate 10 is higher than that of the SiC substrate 20, thereby causing voids 30 formed in a junction interface 15 to move in the thickness direction of the jointed substrate 3; and a step of removing a region including a principal plane 10B of the base substrate 10 on the opposite side of the SiC substrate 20 to remove the voids 30. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011254051(A) |
申请公布日期 |
2011.12.15 |
申请号 |
JP20100128841 |
申请日期 |
2010.06.04 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
SASAKI MAKOTO;HARADA MAKOTO;MASUDA TAKEYOSHI;WADA KEIJI;INOE HIROKI;NISHIGUCHI TARO;OKITA KYOKO;NAMIKAWA YASUO;HORII TAKU |
分类号 |
H01L21/02;H01L21/336;H01L29/12;H01L29/78 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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