发明名称 |
RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS |
摘要 |
The invention provides a resist top coat composition wherein the composition contains polymer (P1-1) with a weight-average molecular weight of 1,000 to 500,000, having at least repeating units represented by the following general formulae (1a), (1b-1), and (1c). There can be a resist top coat composition having excellent water repellent and water sliding properties with fewer development defects and with a good resist pattern profile after development, and a patterning process using this composition.
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申请公布号 |
US2011305979(A1) |
申请公布日期 |
2011.12.15 |
申请号 |
US201113116853 |
申请日期 |
2011.05.26 |
申请人 |
HARADA YUJI;MORISAWA TAKU;WATANABE TAKERU;SUKA YUKI;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HARADA YUJI;MORISAWA TAKU;WATANABE TAKERU;SUKA YUKI |
分类号 |
G03F1/00;C08F220/28;C08F220/38;C08F220/58;C08F228/02;C08K5/06;C09D127/12;G03F7/11;G03F7/20;G03F7/38;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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