发明名称 |
METHOD FOR PRODUCING METAL OXIDE FILM, METAL OXIDE FILM, ELEMENT USING THE METAL OXIDE FILM, SUBSTRATE WITH METAL OXIDE FILM, AND DEVICE USING THE SUBSTRATE WITH METAL OXIDE FILM |
摘要 |
<p>Disclosed are: a metal oxide film, which is formed by a coating method that is one of the methods for producing a metal oxide film, and which has a good balance between excellent transparency and high electrical conductivity, while having excellent film strength; and a method for producing the metal oxide film. Specifically disclosed is a method for producing a metal oxide film, which comprises: a coating step wherein a coating film is formed on a substrate using a metal oxide film-forming coating liquid that contains various organic metal compounds; a drying step wherein the coating film is changed into a dry coating film; and a heating step wherein an inorganic film is formed from the dry coating film. The method for producing a metal oxide film is characterized in that in the heating step, the dry coating film, which is mainly composed of the various organic metal compounds, is heated to a temperature at which at least mineralization of organic metal compound components occurs or higher in an oxygen-containing atmosphere at a temperature not higher than the temperature that is lower by 10°C than the dew point, so that the organic components in the dry coating film are removed by thermal decomposition or combustion, or by thermal decomposition and combustion, thereby forming a metal oxide fine particle layer which is densely filled with metal oxide fine particles that are mainly composed of various metal oxides.</p> |
申请公布号 |
WO2011155635(A1) |
申请公布日期 |
2011.12.15 |
申请号 |
WO2011JP63627 |
申请日期 |
2011.06.08 |
申请人 |
SUMITOMO METAL MINING CO., LTD.;YUKINOBU MASAYA;MURAYAMA YUKI;NAGANO TAKAHITO;OTSUKA YOSHIHIRO |
发明人 |
YUKINOBU MASAYA;MURAYAMA YUKI;NAGANO TAKAHITO;OTSUKA YOSHIHIRO |
分类号 |
C01G27/02;C01B13/32;C01F7/02;C01F17/00;C01G23/04;C01G25/02;C03C17/25;C03C17/27;H01B5/14;H01B13/00 |
主分类号 |
C01G27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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