发明名称 METHOD FOR MACHINING THIN FILM, DEVICE FOR MACHINING THIN FILM AND METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERTER
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method for machining a thin film, and a method for manufacturing a photoelectric converter, wherein defect such as a state that a part of a layer is peeled and floats or a state that electrical division of the layer is not sufficient is suppressed in a division process of each layer of the photoelectric converter or the thin film using a laser. <P>SOLUTION: By combining and using an ultrashort pulse laser and a pulse laser, a sufficient width of the division can be obtained while suppressing heat conduction in a division part, so that occurrence of the peeling of the layer of the division part, an electrical short circuit, and leak current can be suppressed. Thereby, for example, the high-reliability photoelectric converter having a long service life can be obtained. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011251317(A) 申请公布日期 2011.12.15
申请号 JP20100127431 申请日期 2010.06.03
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO
分类号 B23K26/36;B23K26/00;B23K26/06;H01L31/04 主分类号 B23K26/36
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