| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition which has high heat resistance and high transparency properties and from which a cured film having good chemical resistance can be obtained, to provide a cured film such as a flattening film for a TFT substrate and an insulating film for a touch panel formed from the photosensitive siloxane composition, and to provide an element having the cured film such as a display element. <P>SOLUTION: A photosensitive siloxane composition comprises (a) a polysiloxane which is synthesized by reacting one or more organosilanes, (b) a quinonediazide compound, (c) a solvent and (d) a fluorene compound represented by the general formula(2). (In the formula, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>are organic groups having any group selected from an epoxy group, an acrylic group or a methacrylic group, and each R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>may be the same or different.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
