CIRCUIT PATTERN INSPECTION DEVICE, AND INSPECTION METHOD THEREFOR
摘要
<p>Disclosed is a circuit pattern inspection device for inspecting a circuit pattern by: mounting, on a sample stage, a sample substrate formed with a circuit pattern; moving the sample stage in a predetermined direction; scanning a beam from a direction which intersects with the movement of the sample stage; and detecting secondary signals generated from a sample as an inspection image. The speed at which the sample stage is moved and the speed at which the beam is scanned is made slower in a region having a high-density pattern and faster in a region having a low-density pattern, thereby performing inspection by changing the pixel size of the inspection image. As a consequence, it is possible to perform inspection at a high speed and at a sensitivity tailored to the pattern characteristics or the pattern density of a device.</p>
