| 发明名称 |
LOW-TEMPERATURE SYNTHESIS OF SILICA |
| 摘要 |
An ambient pressure Atomic Layer Deposition (ALD) technique to grow uniform silica layers onto organic substrates at low temperatures, including room temperature, is described. For example, tetramethoxysilane vapor is used alternately with ammonia vapor as a catalyst in an ambient environment.
|
| 申请公布号 |
CA2801912(A1) |
申请公布日期 |
2011.12.15 |
| 申请号 |
CA20112801912 |
申请日期 |
2011.06.08 |
| 申请人 |
PRESIDENT AND FELLOWS OF HARVARD COLLEGE |
发明人 |
AIZENBERG, JOANNA;HATTON, BENJAMIN |
| 分类号 |
C23C16/40;C23C16/455;C23C16/54 |
主分类号 |
C23C16/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
