| 发明名称 |
METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR WORK PIECES |
| 摘要 |
A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece. |
| 申请公布号 |
US2011305544(A1) |
申请公布日期 |
2011.12.15 |
| 申请号 |
US201113016742 |
申请日期 |
2011.01.28 |
| 申请人 |
CHEN AIHUA;TODAKA RYOJI;YIN GERALD |
发明人 |
CHEN AIHUA;TODAKA RYOJI;YIN GERALD |
| 分类号 |
H01L21/67;H05B3/06 |
主分类号 |
H01L21/67 |
| 代理机构 |
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| 主权项 |
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