| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a data correction device for lithography, which suppresses increase in an amount of data due to proximity effect correction. Ž<P>SOLUTION: The correction device includes: (S210) correcting a rounding error generated upon converting data for design layout into data for lithography; (S220) determining a correction value for a mask pattern associated with the lithography data, based on the layout environment around the mask pattern; and (S230 to S240) adjusting a correction part which does not influence the correction for degradation due to exposure, in the correction by the correction value. Ž<P>COPYRIGHT: (C)2009,JPO&INPIT Ž</p> |
