发明名称 |
METHOD FOR REMOVING IMPURITIES FROM PHENOL |
摘要 |
PURPOSE: A method for eliminating phenol impurities is provided to minimize costs required for operational processes and replace energy multi-consumable processes using an ion-exchange resin reactor. CONSTITUTION: A method for eliminating phenol impurities includes the following: A phenol mixture containing one selected from hydroxyl acetone, 2-methyl benzo furan, and mesityl oxide is treated using bases and oxidizing chemicals. The treated phenol mixture is reacted in a reactor of 65-95 degrees Celsius. The reactor is filled with ion-exchange resins. One or more selected from hydroxyl acetone, 2-methyl benzo furan, and mesityl oxide is converted into a material of a high boiling point. The generated material of the high boiling point is eliminated through a distilling process to obtain high purity phenol.
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申请公布号 |
KR20110134075(A) |
申请公布日期 |
2011.12.14 |
申请号 |
KR20100053857 |
申请日期 |
2010.06.08 |
申请人 |
LG CHEM. LTD. |
发明人 |
LEE, WON JAE;LEE, DONG CHUL;CHOE, YONG JIN;LEE, JONG KU |
分类号 |
B01D15/36;B01D1/00;B01J47/02;C02F1/42 |
主分类号 |
B01D15/36 |
代理机构 |
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