| 摘要 |
PURPOSE: A manufacturing method of x-ray waveguides using plasmonic light is provided to manufacture a core of the X-rays waveguide by using a nano channel. CONSTITUTION: A nano wire pattern mask for a photolithography manufactures the core of X-rays wave guide. The nano wire pattern mask has the line width of nano millimeters and the length of millimeters. A dielectric nano thin film(10) is evaporated between a metallic foil(20). The nano wire pattern mask uses abnormal light guiding mode through a plasmon. |
