发明名称 |
Reduction of stress during template separation |
摘要 |
Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template. |
申请公布号 |
US8075299(B2) |
申请公布日期 |
2011.12.13 |
申请号 |
US20090581236 |
申请日期 |
2009.10.19 |
申请人 |
XU FRANK Y.;SREENIVASAN SIDLGATA V.;MOLECULAR IMPRINTS, INC. |
发明人 |
XU FRANK Y.;SREENIVASAN SIDLGATA V. |
分类号 |
B29C59/00 |
主分类号 |
B29C59/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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