| 发明名称 |
Vacuum processing apparatus |
| 摘要 |
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body. |
| 申请公布号 |
US8075691(B2) |
申请公布日期 |
2011.12.13 |
| 申请号 |
US20090578918 |
申请日期 |
2009.10.14 |
| 申请人 |
LEE YOUNG JONG;CHOI JUN YOUNG;SON HYOUNG-KYU;LEE JEONG-BIN;KIM GYEONG-HOON;KIM HYUNG-SOO;HAN MYUNG-WOO;ADVANCED DISPLAY PROCESS ENGINEERING CO. LTD. |
发明人 |
LEE YOUNG JONG;CHOI JUN YOUNG;SON HYOUNG-KYU;LEE JEONG-BIN;KIM GYEONG-HOON;KIM HYUNG-SOO;HAN MYUNG-WOO |
| 分类号 |
C23C16/00;B23P19/04;B66C1/00;H01L21/306 |
主分类号 |
C23C16/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
