发明名称 |
Metal precursors for deposition of metal-containing films |
摘要 |
Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-&bgr;-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate. |
申请公布号 |
US8076243(B2) |
申请公布日期 |
2011.12.13 |
申请号 |
US20100693930 |
申请日期 |
2010.01.26 |
申请人 |
DUSSARRAT CHRISTIAN;LANSALOT-MATRAS CLEMENT;OMARJEE VINCENT M.;HSIAO CHENG-FANG;L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;AMERICAN AIR LIQUIDE, INC. |
发明人 |
DUSSARRAT CHRISTIAN;LANSALOT-MATRAS CLEMENT;OMARJEE VINCENT M.;HSIAO CHENG-FANG |
分类号 |
H01L23/48 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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地址 |
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