发明名称 |
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing |
摘要 |
A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector. |
申请公布号 |
US8075698(B2) |
申请公布日期 |
2011.12.13 |
申请号 |
US20050525797 |
申请日期 |
2005.02.25 |
申请人 |
KANNAN HIROSHI;ISHIZAKA TADAHIRO;KOJIMA YASUHIKO;OSHIMA YASUHIRO;SHIGEOKA TAKASHI;TOKYO ELECTRON LIMITED |
发明人 |
KANNAN HIROSHI;ISHIZAKA TADAHIRO;KOJIMA YASUHIKO;OSHIMA YASUHIRO;SHIGEOKA TAKASHI |
分类号 |
B08B7/04;C23C16/44;C23C16/52;H01L21/00;H01L21/205;H01L21/66 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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