发明名称 METHODS OF FORMING SEMICONDUCTOR ELEMENTS USING MICRO-ABRASIVE PARTICLE STREAM
摘要 PURPOSE: A method for forming a semiconductor element is provided to reduce the manufacturing time and cost of a microelectronic unit using sand blasting. CONSTITUTION: A semiconductor element(20), which includes a conductive pad(50), is provided. One or more first openings(30), which are extended from a backside surface(21) to a front side(22), is formed. A second opening(40), in which a part of the top surface and the bottom surface of the conductive pad, is formed. A conductivity contact(90) and a conductive interconnection part(80) are formed. The conductive interconnection part is connected to the conductive pad.
申请公布号 KR101091553(B1) 申请公布日期 2011.12.13
申请号 KR20110024801 申请日期 2011.03.21
申请人 TESSERA INC. 发明人 OGANESIAN VAGE;MOHAMMED ILYAS;MITCHELL CRAIG;HABA BELGACEM;SAVALIA PIYUSH
分类号 H01L23/48;H01L21/60;H01L23/12 主分类号 H01L23/48
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