PLASMA DAMAGE MEASUREMENT APPARATUS

摘要

PURPOSE: A plasma damage measuring device is provided to use a pattern for inducing plasma charging and a measurement pattern, thereby reducing the costs for manufacturing a test wafer. CONSTITUTION: A test wafer(100) comprises a device isolation pattern(210). The device isolation pattern electrically isolates plasma damage measuring devices which are different from at least one plasma damage measuring device(200). Charges induced from plasma are accumulated in an antenna structure. A semiconductor device is connected to the lower part of the antenna structure. The electrical features of the semiconductor device are varied by the accumulated charges.