| 摘要 |
PURPOSE: A thermal processing device, a thermal processing method, and a recording medium are provided to suppress a change of a thermal processing temperature and make the line width of a wiring pattern between substrates uniform. CONSTITUTION: A substrate returning path(2) transfers a substrate(G) in X direction. The substrate returning path includes a cylindrical roller(20) which is expanded in Y direction. A chamber(8) forms a thermal processing space. The chamber includes a first chamber for forming a thermal processing space of a pre-heating unit(4) and a second chamber for forming a thermal processing space of a main heater unit. An outlet has a slit shape. The outlet is placed on the rear wall of the chamber.
|
