| 发明名称 |
COMPOUND FOR PHOTOACID GENERATOR, RESIST COMPOSITION USING THE SAME, AND PATTERN-FORMING METHOD |
| 摘要 |
<p>A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.</p> |
| 申请公布号 |
KR20110133065(A) |
申请公布日期 |
2011.12.09 |
| 申请号 |
KR20117028201 |
申请日期 |
2008.02.14 |
| 申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
HAGIWARA YUJI;JODRY JONATHAN JOACHIM;NARIZUKA SATORU;MAEDA KAZUHIKO |
| 分类号 |
C07C309/27;C07C381/12;C08F20/24;G03F7/004 |
主分类号 |
C07C309/27 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
