DRESSING METHOD FOR PAD CONDITIONER AND PAD CONDITIONER DRESSED THEREBY

摘要

PURPOSE: A method for pre-treating a CVD pad conditioner and the CVD pad conditioner which is pre-treated thereby are provided to execute conditioning for a brief time by eliminating grain of the upper side of a projecting tip. CONSTITUTION: A CVD(Chemical Vapor Deposition) pad conditioner is dressed before being used in a CMP(Chemical Mechanical Planarization) polishing pad conditioning apparatus. The CVD pad conditioner is touched to a polishing plate in which polishing powder is attached. The CVD pad conditioner and the polishing plate are relatively operated. The speed of rotation of the CVD pad conditioner and the polishing plate is 5rpm to 50rpm. The pressure which is applied to a contact area of the CVD pad conditioner and the polishing plate is 0.1lbf to 4lbf. The touching time of the CVD pad conditioner and the polishing plate is 1min to 10min.