TEXTURING OF MULTI-CRYSTALLINE SILICON SUBSTRATES

摘要

Etching solutions for etching and texturing of multi-crystalline silicon substrates, particularly for use as solar cells or photovoltaic devices are described. The solutions of the present invention provide more consistent and uniform texturing over the entire life of the solution, resulting in fewer discarded wafers, increased reliability and yield and lower costs. The etching solutions HF/HN03/H20 solutions having silicon dissolved therein.