| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film which does not require a low reflective index layer to have thermal history twice and is capable of avoiding deterioration in luminous reflectance, haze value, curling property and the like. <P>SOLUTION: A method for manufacturing an antireflection film, where a transparent base material film has a low refractive index layer on one surface and a thermosetting function layer on the other surface, comprises the steps: A-1 to apply, to the one surface of the transparent base material film, coating liquid for the low refractive index layer which contains an ionizing radiation curable resin and an alkoxysilane and is diluted by organic solvent; A-2 to dry the coated film; A-3 to form a semi-cured film by irradiating the dried film with ionizing radiation to harden only the ionizing radiation curable resin; B-1 to apply the coating liquid for the thermosetting function layer to the other surface of the transparent base material film; and B-2 to simultaneously heat the coated film and the semi-cured film to produce both the thermosetting function layer and the low refractive index layer at the same time. <P>COPYRIGHT: (C)2012,JPO&INPIT |
