| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition with superior LWR, pattern collapse property and DOF, and to provide a method for forming a pattern using the same. <P>SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes: (A) a resin which includes a repeating unit having a partial structure represented by the following general formula (I) and whose solubility rate with respect to an alkaline developer is increased by the action of an acid; (B) a compound (PA) which includes a proton-accepting functional group, decomposes by irradiation with actinic rays or radiation to generate a compound whose proton-accepting property is reduced or lost or is changed to acidity; and (C) a compound which generates an acid by irradiation with actinic rays or radiation. The content of the composition of the resin with respect to the total solid content is 50% or more by mass. In the general formula, R<SB POS="POST">13</SB>represents a hydrogen atom, an alkyl group or a cycloalkyl group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
