| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device capable of carrying out plasma processing by certainly supplying gas. <P>SOLUTION: A plasma processing device comprises an outer gas supply member 40 having a gas supply port supplying gas for plasma processing, and a jacket portion 27 which is a gas supply member supporting device for supporting the outer gas supply member 40 in a processing container. The jacket portion 27 includes three supporting members 44-46 provided at intervals in an extending direction of the gas supply member so as to couple the outer gas supply member 40 and a side wall, and mounting portions 47-49 fixed on the side wall and capable of mounting the supporting members. The supporting members include a first supporting member 44 fixed and mounted to the first mounting portion 47, and the second supporting members 45, 46 mounted so as to be freely supported by the second mounting portions 48, 49. <P>COPYRIGHT: (C)2012,JPO&INPIT |
