发明名称 Sputtering Target And Method Of Fabrication
摘要 A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
申请公布号 US2011297536(A1) 申请公布日期 2011.12.08
申请号 US201113169284 申请日期 2011.06.27
申请人 WICKERSHAM, JR. CHARLES E.;LEVIT VLADIMIR;ALEXANDER P. TODD;CABOT CORPORATION 发明人 WICKERSHAM, JR. CHARLES E.;LEVIT VLADIMIR;ALEXANDER P. TODD
分类号 C23C14/34;B32B3/02 主分类号 C23C14/34
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