| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of projecting a mask pattern image that is adjusted to the utmost to a distortion deformation present on a work substrate. <P>SOLUTION: An exposure device composes: a parallel plane plate 31 disposed in the projection optical path of a mask pattern 13' that is projected on a work substrate 14; restraint members providing a supporting point at the intermediate position between a corner 31A and another corner 31A, both formed by two intersecting sides of the parallel plane plate 31; and a distortion deformation generating mechanism 17 constructed by pressure members that give distortion deformation on the parallel plane plate 31 with the restraint member as a supporting point by applying pressure force to each corner 31A of the parallel plane plate 31 in the optical axis direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
