发明名称 |
METHOD FOR MANUFACTURING SUBSTRATE FOR SUSPENSION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate for a suspension with low rigidity that can be manufactured with high yield. <P>SOLUTION: A substrate for a suspension includes: at least a metal substrate; an insulating layer formed on the metal substrate; a seed layer formed on the insulating layer; and a wiring pattern layer formed of a metal plating layer formed into a pattern shape on the seed layer. A difference between a maximum film thickness portion and a minimum film thickness portion of the wiring pattern layer is 2 μm or less. In the substrate, an opening portion is formed in the insulating layer, and a cover layer is provided which is formed on the wiring pattern layer by using a cover material and has a wiring pattern layer exposed opening portion with an exposed part of the surface of the wiring pattern layer. A difference between a maximum film thickness portion and a minimum film thickness portion of the cover layer on the wiring pattern layer is 1 μm or less. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011249000(A) |
申请公布日期 |
2011.12.08 |
申请号 |
JP20110160999 |
申请日期 |
2011.07.22 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
MOMOSE TERUSUMI;YAMAZAKI TAKESHI;KUMON SHINJI;MIURA YOICHI;HITOMI YOICHI |
分类号 |
G11B5/60;G11B21/21;H05K1/05 |
主分类号 |
G11B5/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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