发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR SUSPENSION
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate for a suspension with low rigidity that can be manufactured with high yield. <P>SOLUTION: A substrate for a suspension includes: at least a metal substrate; an insulating layer formed on the metal substrate; a seed layer formed on the insulating layer; and a wiring pattern layer formed of a metal plating layer formed into a pattern shape on the seed layer. A difference between a maximum film thickness portion and a minimum film thickness portion of the wiring pattern layer is 2 &mu;m or less. In the substrate, an opening portion is formed in the insulating layer, and a cover layer is provided which is formed on the wiring pattern layer by using a cover material and has a wiring pattern layer exposed opening portion with an exposed part of the surface of the wiring pattern layer. A difference between a maximum film thickness portion and a minimum film thickness portion of the cover layer on the wiring pattern layer is 1 &mu;m or less. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011249000(A) 申请公布日期 2011.12.08
申请号 JP20110160999 申请日期 2011.07.22
申请人 DAINIPPON PRINTING CO LTD 发明人 MOMOSE TERUSUMI;YAMAZAKI TAKESHI;KUMON SHINJI;MIURA YOICHI;HITOMI YOICHI
分类号 G11B5/60;G11B21/21;H05K1/05 主分类号 G11B5/60
代理机构 代理人
主权项
地址