发明名称 METHODS AND DEVICE FOR LASER PROCESSING
摘要 The present invention relates to laser ablation microlithography. In particular, we disclose a new SLM design and patterning method that uses multiple mirrors per pixel to concentrate energy to an energy density that facilitates laser ablation, while keeping the energy density on the SLM mirror surface at a level that does not damage the mirrors. Multiple micro-mirrors can be reset at a very high frequency, far beyond current DMD devices.
申请公布号 WO2011107602(A3) 申请公布日期 2011.12.08
申请号 WO2011EP53336 申请日期 2011.03.04
申请人 MICRONIC MYDATA AB;SANDSTROEM, TORBJOERN 发明人 SANDSTROEM, TORBJOERN
分类号 G03F7/20;B23K26/06;B23K26/067;G02B26/08 主分类号 G03F7/20
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