发明名称 SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION THEREOF
摘要 <p>Disclosed are: a semiconductor device equipped with a penetrated electrode (19); and a process for producing the semiconductor device. In the device and the process, an insulated-part-forming dummy slot (7b) which can insulate between wiring lines is arranged so as to surround a rewiring line layer (18) that involves the penetrated electrode (19) arranged on the back surface of a semiconductor substrate (5). For insulating between wiring lines, only a metal layer arranged on the bottom of the insulated-part-forming dummy slot (7b) has to be removed. Therefore, the treatment time can be reduced.</p>
申请公布号 WO2011151961(A1) 申请公布日期 2011.12.08
申请号 WO2011JP01825 申请日期 2011.03.28
申请人 PANASONIC CORPORATION;TAKII, YOSHIMASA;KAI, TAKAYUKI;SAITO, DAISHIRO;OKUMA, TAKAFUMI 发明人 TAKII, YOSHIMASA;KAI, TAKAYUKI;SAITO, DAISHIRO;OKUMA, TAKAFUMI
分类号 H01L21/3205;H01L23/52 主分类号 H01L21/3205
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