MOLD FOR NANOIMPRINT, AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a mold for a nanoimprint which has high durability and is provided with excellent mold releasability, and to provide a method for easily producing the mold.

SOLUTION: The mold 1 for a nanoimprint includes: a base material 2; a resin layer 3 covering one face 2a of the base material 2; and a recessed part 4 located at the face 3a of the resin layer 3. In the resin layer 3, the water contact angle of the surface is controlled to ≥80° and its HV hardness is controlled to ≥400. The mold 1 for a nanoimprint is formed by coating one face 2a of the base material 2 with a coating liquid at least containing organopolysiloxane and a photocatalyst to form a wettability-changing resin material layer 3' in a coating step, press-fitting the wettability-changing resin material layer 3' and a master mold 11 and subjecting the wettability-changing resin material layer 3' to drying treatment in this state to form a resin layer 3 in a drying step, and separating the resin layer 3 and the master mold 11 in a peeling step.

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