发明名称 METHOD FOR MANUFACTURING SEED CRYSTAL OF GROUP III NITRIDE SEMICONDUCTOR, METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR SINGLE CRYSTAL, METHOD FOR MANUFACTURING SUBSTRATE, AND SEED CRYSTAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a seed crystal of a group III nitride semiconductor which can obtain a good crystalline group III nitride semiconductor single crystal when expansion growth is carried out, and to provide a method for manufacturing the group III nitride semiconductor single crystal. <P>SOLUTION: The method for manufacturing a seed crystal of a group III nitride semiconductor comprises as follows. By a vapor phase growth method, two or more nucleuses of a group III nitride semiconductor are made to be estranged to be formed on a member 1 for seed crystal forming, the two or more nucleuses are grown up, and two or more seed crystals 2 are obtained from the two or more nucleuses. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011246304(A) 申请公布日期 2011.12.08
申请号 JP20100120116 申请日期 2010.05.26
申请人 FURUKAWA CO LTD 发明人 ISHIHARA YUJIRO;NISHIGORI YUTAKA
分类号 C30B29/38;C30B25/18;H01L21/205 主分类号 C30B29/38
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