SYSTEM AND METHOD FOR RECOVERING SPENT ETCHING SOLUTION

摘要

A system for recovering a spent etching solution is provided. The system including an etching device which is used for producing the spent etching solution in an etching reaction, an oxidation device which includes a first processing section for removing ammonia from the spent etching solution and a second processing section for oxidizing the spent solution passed from the first processing section, a regeneration device for regenerating the spent etching solution passed from the second processing section and an electrolysis device for plate out copper from the spent solution passed from the second processing section. At the same time, a method for recovering a spent etching solution is provided. The spent etching solution, by the system and method, can be recovered up to almost 100%.