发明名称 FABRICATION METHOD OF ETCHING MASK, ETCHING MASK THEREBY, AND ETCHING METHOD THEREBY
摘要 <p>PURPOSE: A method for manufacturing an etching mask, an etching mask thereof, and an etching method using the same are provided to improve the quality of etching by increasing the adhesion of the etching mask of an etching object. CONSTITUTION: An upper mold(12) and a bottom mold(14) are prepared. The surface of the upper mold and the bottom mold are plasma-processed. A polymer resin solution(30) is filled in a space(16) which is formed between the upper mold and the low mold. The polymer resin solution is hardened. A hardened polymer resin solution becomes released from the upper mold and the bottom mold.</p>
申请公布号 KR101090963(B1) 申请公布日期 2011.12.08
申请号 KR20100074012 申请日期 2010.07.30
申请人 GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 YANG, SUNG;CHOI, JONG CHAN;LEE, DONG HEE
分类号 H01L21/027 主分类号 H01L21/027
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