发明名称 |
MICROMACHINE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A semiconductor element of the electric circuit includes a semiconductor layer over a gate electrode. The semiconductor layer of the semiconductor element is formed of a layer including polycrystalline silicon which is obtained by crystallizing amorphous silicon by heat treatment or laser irradiation, over a substrate. The obtained layer including polycrystalline silicon is also used for a structure layer such as a movable electrode of a structure body. Therefore, the structure body and the electric circuit for controlling the structure body can be formed over one substrate. As a result, a micromachine can be miniaturized. Further, assembly and packaging are unnecessary, so that manufacturing cost can be reduced.
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申请公布号 |
US2011297940(A1) |
申请公布日期 |
2011.12.08 |
申请号 |
US201113214293 |
申请日期 |
2011.08.22 |
申请人 |
YAMAGUCHI MAYUMI;IZUMI KONAMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAGUCHI MAYUMI;IZUMI KONAMI |
分类号 |
H01L29/786;H01L21/20;H01L21/283 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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