发明名称 |
CHARGED PARTICLE BEAM APPARATUS, SAMPLE TRANSPORT APPARATUS, MASK POSITION ADJUSTMENT MECHANISM, SAMPLE POSITION ADJUSTMENT METHOD, AND MASK POSITION ADJUSTMENT METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus, a sample transport apparatus, a mask position adjustment mechanism, a sample position adjustment method and a mask position adjustment method, which enable more flexible adjustment of a sample or a mask position without restrictions by wiring in sample or mask movable range. <P>SOLUTION: A sample transport apparatus 040 adjusts the position of a sample with respect to a sample stage 008 of a charged particle beam apparatus. The sample transport apparatus has: an infrared lamp control unit 014 which generates an output instruction signal according to an instruction from an SEM control unit 015; an infrared lamp 010 which radiates an infrared signal according to the output instruction signal from the infrared lamp control unit 014; a sample stand holder 007 fixed on the sample stage 008; a sample stand 102 movably attached to the sample stand holder 007; an infrared sensor 108 which receives light of the infrared signal from the infrared lamp 010; and a motor 110 which drives the sample stand 102 according to the infrared signal received by the infrared sensor 108. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011249246(A) |
申请公布日期 |
2011.12.08 |
申请号 |
JP20100123469 |
申请日期 |
2010.05.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
INAGI YUKI;KUROSAWA KOICHI;TAKASU HISAYUKI |
分类号 |
H01J37/20;H01J37/305;H01J37/317 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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