| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a rotation stand which includes a first rotation mechanism for rotating an object surface to be cleaned and a second rotation mechanism for revolving the object surface to be cleaned around a shaft different from a shaft of the rotation, in which dust attached to the object surface to be cleaned is removed. <P>SOLUTION: The rotation stand includes the first rotation mechanism for rotating the object surface to be cleaned and the second rotation mechanism for revolving the object surface to be cleaned around the shaft different from the shaft of the rotation, wherein the rotation stand has a cleaning means for removing the dust attached to the object surface to be cleaned. <P>COPYRIGHT: (C)2012,JPO&INPIT |
