ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

摘要

PURPOSE: An electrostatic chuck and a substrate processing apparatus including the same are provided to uniformly heat a substrate by forming a heating layer to have a higher second heat transfer coefficient than a first heat transfer coefficient. CONSTITUTION: An electrostatic layer(200) supports a substrate(10) on the top. An electrostatic electrode(210), which generates an electrostatic force, is arranged in the electrostatic layer. A heating layer(300) is arranged in the lower part of the electrostatic layer. A heat generating electrode(310), which generates heat to heat the substrate, is arranged in the heating layer. An insulation layer(400) blocks the heat which is generated from the heat generating electrode to the lower part and induces the heat to the top.