| 摘要 |
<p>PURPOSE: A method for cleaning a solar cell substrate is provided to control the influence of contaminants in the formation of a passivation layer by performing one of an atmospheric pressure plasma cleaning process or an excimer ultraviolet cleaning process before a passivation layer is formed. CONSTITUTION: A monocrystal or a poly silicon substrate(100) is prepared. An uneven portion is formed in the surface of the substrate by wet etching. Atmospheric pressure plasma cleaning is performed for the substrate in which the uneven portion is formed. The atmospheric pressure plasma cleaning is performed during substrate transfer. Excimer ultraviolet cleaning is performed after the atmospheric pressure plasma cleaning.</p> |
