Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.
申请公布号
EP2391700(A2)
申请公布日期
2011.12.07
申请号
EP20100736288
申请日期
2010.01.26
申请人
ADVANCED TECHNOLOGY MATERIALS, INC.
发明人
CHEN, TIANNIU;BILODEAU, STEVEN;BOGGS, KARL E.;JIANG, PING;KORZENSKI, MICHAEL B.;MIRTH, GEORGE;VAN BERKEL, KIM
