发明名称 WAFER PROCESSING SYSTEM HAVING LINEAR WAFER TRANSFERING APPARATUS
摘要 PURPOSE: A substrate processing system which includes a linear substrate transfer apparatus is provided to load/unload multiple sheets of substrates to a process chamber at the same time, thereby improving productivity by reducing substrate return time. CONSTITUTION: A process chamber(300a,300b) comprises a substrate support stand in which a substrate is loaded. A transfer chamber(400) is arranged in an edge area of the process chamber. A load-lock chamber(200) respectively loads an unprocessed substrate and a processed substrate. A substrate transfer apparatus(500) loads/unloads the substrate within the process chamber while being included in the inside of the transfer chamber. The substrate transfer apparatus includes a vertical transfer rail, a support bar, and an end effecter.
申请公布号 KR20110131835(A) 申请公布日期 2011.12.07
申请号 KR20100051479 申请日期 2010.05.31
申请人 NP HOLDINGS CO., LTD. 发明人 CHOI, DAI KYU
分类号 H01L21/677;B25J9/02;B25J15/08;B65G49/06 主分类号 H01L21/677
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