PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS AND CORRESPONDING METHODS

摘要

PURPOSE: A patterned inorganic layer, a patterning composition based on radiation ray, and a method for the same are provided to form features of high resolution in a patterned coating material and to protect features of high aspect ratio in the patterned coating material. CONSTITUTION: An inorganic pattering precursor aqueous solution includes the mixture of water, metal suboxide cation, inorganic polyatomic anion, and radiation-sensitive ligand containing a peroxide group. The molar ratio of the ligand with respect to the metal suboxide cation is more than or equal to about 2. The precursor aqueous solution is stable to phase separation for about 2 hours without additional mix. The concentration of the metal suboxide cation is between about 0.01 and 1.4M. The metal suboxide cation includes HfO^(+2), ZrO^(+2), and the combination of the same.