发明名称 Method of forming metal film and metal wiring pattern, undercoat composition for forming metal film and metal wiring pattern, and metal film
摘要 A method of forming a metal film and a metal wiring pattern is described a step of forming an organic film by applying and polymerizing an undercoat composition for forming a metal film containing an addition-polymerizable monomer having an acidic group and a polymerization initiator on a substrate or film, a step of converting the acidic group into a metal (M1) salt by treating the organic film with an aqueous solution containing a metal (M1) ion, a step of converting the metal (M1) salt into a metal (M2) salt by treating the organic film with an aqueous solution containing a metal (M2) ion having an ionization tendency lower than the metal (M1) ion, and a step of forming a metal film on the organic film surface by reducing the metal (M2) ion.
申请公布号 US8071178(B2) 申请公布日期 2011.12.06
申请号 US20060917133 申请日期 2006.06.06
申请人 NAKAJIMA SEIJI;MORI TETSUYA;NAWAFUNE HIDEMI;OMRON CORPORATION 发明人 NAKAJIMA SEIJI;MORI TETSUYA;NAWAFUNE HIDEMI
分类号 C08F2/48;C08F2/50 主分类号 C08F2/48
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