发明名称 Semiconductor device and method of manufacturing the same
摘要 Any of a plurality of contact plugs which reaches a diffusion layer serving as a drain layer of an MOS transistor has an end provided in contact with a lower surface of a thin insulating film provided selectively on an interlayer insulating film. A phase change film constituted by GST to be a chalcogenide compound based phase change material is provided on the thin insulating film, and an upper electrode is provided thereon. Any of the plurality of contact plugs which reaches the diffusion layer serving as a source layer has an end connected directly to an end of a contact plug penetrating an interlayer insulating film.
申请公布号 US8071456(B2) 申请公布日期 2011.12.06
申请号 US20100870611 申请日期 2010.08.27
申请人 MONIWA MASAHIRO;NITTA FUMIHIKO;MATSUOKA MASAMICHI;IIDA SATOSHI;RENESAS ELECTRONICS CORPORATION 发明人 MONIWA MASAHIRO;NITTA FUMIHIKO;MATSUOKA MASAMICHI;IIDA SATOSHI
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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