发明名称 |
Chemical vapor deposition method and system for semiconductor devices |
摘要 |
A method of and system for chemical vapor deposition of layers of material on substrates for producing semiconductor devices provides for continuous in-line processing. The method includes continuously conveying a plurality of substrates through a plurality of in-line deposition regions, continuously providing and distributing a chemical vapor at each region to deposit material for the layer, and continuously supplying a flow of chemical material for each region to provide the chemical vapor. The system includes a continuous in-line substrate conveyance apparatus for moving a plurality of substrates through a plurality of deposition regions, a deposition head for providing and distributing a chemical vapor at each of the regions to deposit material for the layers, and a chemical material supply apparatus for providing a flow of chemical materials to each of the heads for the chemical vapor.
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申请公布号 |
US8071165(B2) |
申请公布日期 |
2011.12.06 |
申请号 |
US20080188468 |
申请日期 |
2008.08.08 |
申请人 |
KAPUR VIJAY K.;KEMMERLE RICHARD T.;LE PHUCAN;INTERNATIONAL SOLAR ELECTRIC TECHNOLOGY, INC. |
发明人 |
KAPUR VIJAY K.;KEMMERLE RICHARD T.;LE PHUCAN |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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地址 |
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