发明名称 |
Lithography systems and processes |
摘要 |
An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive layer; and providing a mask capable of defining at least one pattern that is to be transferred to the photo-sensitive layer. Specifically, the substrate has a top surface on or over the photo-sensitive layer, and the mask receives an electromagnetic wave from the light source at a first surface of the mask and generates a plurality of electromagnetic components from a second surface of the mask. The lithography process may also include: providing a lens, which provides a flat surface at a bottom surface of the lens, for transferring the pattern to the photo-sensitive layer; and adjusting the distance between the flat surface of the lens and the top surface of the substrate to control the number and amount of the electro-magnetic components projected onto the photo-sensitive layer. |
申请公布号 |
US8072577(B2) |
申请公布日期 |
2011.12.06 |
申请号 |
US20060422284 |
申请日期 |
2006.06.05 |
申请人 |
WU TZONG HSIEN;YANG TA HUNG;LU CHIH YUAN;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
WU TZONG HSIEN;YANG TA HUNG;LU CHIH YUAN |
分类号 |
G02B7/02;G03B27/32;G03B27/52;G03B27/54 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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