发明名称 Nonvolatile semiconductor memory device
摘要 A first select transistor is connected to one end of a plurality of memory cell transistors that are serially connected. A second select transistor is connected to the other end of the serially connected memory cell transistors. A first impurity diffusion region is formed in a semiconductor substrate and constitutes a first main electrode of the first select transistor. A second impurity diffusion region is formed in the semiconductor substrate and constitutes a second main electrode of the second select transistor. A depth of the first impurity diffusion region is greater than a depth of the second impurity diffusion region.
申请公布号 US8072020(B2) 申请公布日期 2011.12.06
申请号 US20090412884 申请日期 2009.03.27
申请人 GOMIKAWA KENJI;KUTSUKAKE HIROYUKI;KATO YOSHIKO;NOGUCHI MITSUHIRO;KABUSHIKI KAISHA TOSHIBA 发明人 GOMIKAWA KENJI;KUTSUKAKE HIROYUKI;KATO YOSHIKO;NOGUCHI MITSUHIRO
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
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