CHEMICAL VAPOR DEPOSITION DEVICE

摘要

PURPOSE: A chemical vapor deposition device is provided to prevent the leakage of gas by processing the cover of a gas divider with double sealing. CONSTITUTION: In a chemical vapor deposition device, a chamber(500) comprises a first area(R1) and a second area(R2). The first area and the second area are divided by a first shower plate(120). The first shower plate comprises a first gas injector and a first diffuser(130). A first susceptor(110) is arranged in the second area of the chamber. The first shower plate comprises a first gas divider.