| 摘要 |
An exemplar dimension measuring apparatus includes a objective, a stage for fixing a workpiece, a projecting member located between the objective and the stage, a light source under the stage, configured for illuminating the workpiece such that a projection of the workpiece is formed on the projection member, an eyepiece coupled with the objective, and a processing unit. The eyepiece has a reticle, configured for viewing opposite extremities of the projection and facilitating alignment of the reticle with each of the extremities of the projection. The processing unit is configured for storing X-coordinates of the extremities of the projection on a Cartesian coordinate system, and calculating a difference between X-coordinates of the opposite extremities of the projection. |
