发明名称 Semiconductor device and method for fabricating the same
摘要 The invention primarily provides gate electrodes and gate wirings permitting large-sized screens for active matrix-type display devices, wherein, in order to achieve this object, the construction of the invention is a semiconductor device having, on the same substrate, a pixel TFT provided in a display region and a driver circuit TFT provided around the display region, wherein the gate electrodes of the pixel TFT and the driver circuit TFT are formed from a first conductive layer, the gate electrodes are in electrical contact through connectors with gate wirings formed from a second conductive layer, and the connectors are provided outside the channel-forming regions of the pixel TFT and the driver circuit TFT.
申请公布号 US8071981(B2) 申请公布日期 2011.12.06
申请号 US20100839113 申请日期 2010.07.19
申请人 YAMAZAKI SHUNPEI;KOYAMA JUN;TAKAYAMA TORU;HAMATANI TOSHIJI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KOYAMA JUN;TAKAYAMA TORU;HAMATANI TOSHIJI
分类号 H01L29/24;G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L29/24
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