发明名称 |
THREE DIMENSIONAL SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A three-dimensional semiconductor memory apparatus a manufacturing method thereof are provided to re-crystallize a part of a semiconductor pattern adjacent to laminated conductive patterns by directly projecting a laser, thereby improving charge mobility in the operation of the three-dimensional semiconductor memory apparatus. CONSTITUTION: A laminate structure comprises a plurality of conductive patterns(123,124). An active post(AP) is connected to a substrate by penetrating the laminate structure. The active post comprises a first semiconductor pattern(162) and a second semiconductor pattern(165). The first semiconductor pattern is arranged within a recess region(a) defined in the laminate structure. The second semiconductor pattern is arranged within a penetration region(b) defined in the laminate structure. A data storage pattern(150) is placed between the active post and conductive patterns.</p> |
申请公布号 |
KR20110130916(A) |
申请公布日期 |
2011.12.06 |
申请号 |
KR20100050479 |
申请日期 |
2010.05.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
NAKANISHI TOSHIRO;LEE, CHOONG MAN |
分类号 |
H01L27/115;H01L21/8242 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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